Electron beam apparatus using electron source, spacers having high-resistance film and low-resistance layer, and image-forming device using the same
US6441544B1 · kind B1 · utility
25Cited by
11References
58Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 22, 1999 |
| Grant date | Aug 27, 2002 |
| Priority date | — |
| Expiry date | Jun 22, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/866
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
This invention provides an arrangement for alleviating the electric charge of members apt to be electrically charged such as spacers used in an electron beam apparatus by arranging a high resistance film thereon. Particularly, the low resistance layer arranged at each of the members is covered by a high resistance film to suppress any electric discharges.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.