Carbon-based field emission electron device for high current density applications
US6441550B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 12, 1998 |
| Grant date | Aug 27, 2002 |
| Priority date | — |
| Expiry date | Oct 12, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/30446
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron field emission device is provided by placing a substrate in a reactor, heating the substrate and supplying a mixture of hydrogen and a carbon-containing gas to the reactor while supplying energy to the mixture of gases near the substrate for a time to grow a carbon-based body to a thickness greater than 20 micrometers, subsequently removing the substrate and then applying an electrical contact to one surface of the body. The device is free-standing and can be used as a cold cathode in a variety of electronic devices such as cathode ray tubes, amplifiers and traveling wave tubes. The surface of the substrate may be patterned before growth of the carbon-based body to produce a patterned surface on the field emission device after the substrate is removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.