Apparatus and methods for generating persistent ionization plasmas
US6441552B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 29, 1999 |
| Grant date | Aug 27, 2002 |
| Priority date | — |
| Expiry date | Apr 29, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/52
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A persistent ionization plasma generator is described that forms a plasma in a cavity that persists for a time after termination of the exciting RF electric field. The plasma generator includes a RF cavity that is in fluid communication with a source of ionizing gas. The RF cavity can be at substantially atmospheric pressure. An RF power source that generates an RF electric field is electromagetically coupled to the RF cavity. An ultraviolet light source is positioned in optical communication to the cavity. An antenna is positioned within the cavity adjacent to the ultraviolet light source. A chamber for confining the plasma can be positioned in the cavity around the antenna.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.