Patent · US Expired

Cleaning apparatus for removing residues

US6443170B1 · kind B1 · utility

6Cited by

7References

10Claims

0Family size

Assignee

BASF SE

Inventors

Frans Vansant · Kalmthout, BE
Jozef de Hert · Antwerpen, BE
Dieter Köffer · Birkenau, DE
Gerhard Theis · Frankenthal (Pfalz), DE
Winfried Terjung · Dinslaken, DE

Key dates

Filing date	Dec 1, 1999
Grant date	Sep 3, 2002
Priority date	—
Expiry date	Dec 1, 2019

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB08B9/08
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A cleaning apparatus for removing residues from the bottoms outflow of an evaporation apparatus which produces tops product and bottoms product and is equipped with an outflow, comprising:a) an outflow vessel (7),b) a collection vessel (8),c) an outflow valve, (10),d) a cleaning water valve (11),e) a vessel outflow valve (12),f) a cleaning outflow valve (13),g) a vent valve (14),h) a line (17) leading from the bottom to the outflow valve (10),i) a cleaning agent introduction tube (3),j) an outflow line device (6, 16) andconnection lines between the devices a) to j).The cleaning apparatus can be used in the workup of salt-containing solutions by distillation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.