Low dielectric materials and methods of producing same
US6444715B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2000 |
| Grant date | Sep 3, 2002 |
| Priority date | — |
| Expiry date | Jun 9, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/259
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In accordance with the present invention, compositions and methods are provided in which the mechanical strength and durability of a precursor material having a plurality of pores is increased by a) providing a precursor material; b) treating the precursor material to form a nanoporous aerogel, preferably by using a supercritical drying process; c) providing a blending material having a reinforcing component and a volatile component; d) combining the nanoporous aerogel and the blending material to form an amalgamation layer; and e) treating the amalgamation layer to increase the mechanical strength of the layer by a substantial amount, and to ultimately form a low dielectric material that can be utilized in various applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.