Patent · US Expired

Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source

US6444945B1 · kind B1 · utility

60Cited by
29References
30Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 28, 2001
Grant dateSep 3, 2002
Priority date
Expiry dateMar 28, 2021

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H1/466
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A plasma source includes a structure made up of two hollow cathode shapes connected to a bipolar AC power supply. The bipolar power supply alternately drives one hollow cathode to a negative voltage while the opposite hollow cathode is driven to a positive voltage. As one of the two hollow cathode shapes is driven negative, the hollow cathode discharge forms within the corresponding cavity. The other cathode then forms an anode, causing electrons to escape the plasma and travel to the other side, completing the electric circuit. The plasma generator thus formed may be used as a heat source for an effusion cell to form a plasma from a reactant gas, or to increase the reactivity of gas situated between a vacuum deposition source and a substrate to be coated.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.