Substrate cleaning apparatus with brush force control and method
US6446296B1 · kind B1 · utility
8Cited by
13References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 6, 2000 |
| Grant date | Sep 10, 2002 |
| Priority date | — |
| Expiry date | Mar 6, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67046
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate cleaning apparatus with a vertically extending spindle having a substrate supported on its upper end. A brush extends generally horizontally over the substrate, and a force measuring gage is mounted with respect to the spindle for detecting forces applied to the substrate. A spindle drive moves the spindle upward and downward directions, and a spindle control is electrically connected to the force measuring gage and causes the spindle drive to move upward and downward in response to cleaning forces being detected by the force measuring gage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.