Ceramic materials resistant to halogen plasma and components using the same
US6447937B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 26, 1998 |
| Grant date | Sep 10, 2002 |
| Priority date | — |
| Expiry date | Feb 26, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/26
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A member used within a plasma processing apparatus and exposed to a plasma of a halogen gas such as BCl3 or Cl2 is formed from a sintered body of metals of Group IIIa of Periodic Table such as Y, La, Ce, Nd and Dy, and Al and/or Si, for example, 3Y2O3·5Al2O3, 2Y2O3·Al2O3, Y2O3·Al2O3 or disilicate or monosilicate, and in particular, in this sintered body, the content of impurity metals of Group IIa of Periodic Table contained in the sintered body is controlled to be 0.15 wt % or more in total. Specifically, for this member, an yttrium-aluminum-garnet sintered body having a porosity of 3% or less and also having a surface roughness of 1 &mgr;m or less in center line average roughness Ra is utilized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.