Amplitude mask for writing long-period gratings
US6447959B1 · kind B1 · utility
1Cited by
2References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 17, 2000 |
| Grant date | Sep 10, 2002 |
| Priority date | — |
| Expiry date | May 17, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0005
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Long-period gratings are written more quickly and at higher intensities by amplitude masks having shadow-forming patterns that scatter, redirect, or otherwise divert shadow portions of radiation used for writing the gratings instead of blocking the shadow portions by absorption or reflection. The shadow-forming masks can be formed along transparent base optics by arrays of diffusers, diffractors, or refractors that relatively divert different portions of the radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.