Smart photolithography
US6447983B1 · kind B1 · utility
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6Claims
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Key dates
| Filing date | May 24, 2000 |
| Grant date | Sep 10, 2002 |
| Priority date | — |
| Expiry date | May 24, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photolithography method includes applying to a substrate a coating of a film forming composition containing a bonding resin and a film forming material and drying to form a film; selectively coating the film with a photosensitive composition including a photosensitizer to form a film pattern; exposing the film with the film pattern; and developing the film. Therefore, a film in a pattern and having excellent characteristics can be manufactured easily and efficiently. The photolithography method can be applied to any product which requires the formation of a film in a pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.