Patent · US Expired

Electronic power device integrated on a semiconductor material and related manufacturing process

US6448125B1 · kind B1 · utility

3Cited by
20References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 27, 1999
Grant dateSep 10, 2002
Priority date
Expiry dateJan 27, 2019

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/038

Abstract

An electronic power device is integrated on a substrate of semiconductor material having a first conductivity type, on which an epitaxial layer of the same type of conductivity is grown. The power device comprises a power stage PT and a control stage CT, this latter enclosed in an isolated region having a second type of conductivity type. The power stage PT comprises a first buried area having the second type of conductivity type and a second buried area, partially overlapping the first buried area and having the first conductivity type. The isolation region and the control stage CT comprise respectively a third buried area, having the second conductivity type, and a fourth buried area, partially overlapped to the third buried area and having the first conductivity type. Said first, second, third and fourth buried areas are formed in the epitaxial layers at a depth sufficient to allow the power stage PT and the control stage CT to be entirely formed in the epitaxial layers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.