Method of manufacturing gas discharge display devices using plasma enhanced vapor deposition
US6450849B1 · kind B1 · utility
10Cited by
6References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 12, 1999 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Apr 12, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2211/38
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A fabricating method of a gas discharge display device having a dielectric layer spreading over an entire display area so as to cover electrodes arranged on a substrate, comprising arranging the electrodes on the substrate; and forming conformally the dielectric layer upon a surface of the substrate, on which the electrodes have been arranged, by the use of a plasma vapor deposition method. The fabricating method may further comprise forming a light shielding layer between the electrodes excluding at least the surface discharge gap within the display area before forming the dielectric layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.