Photosensitive composition

US6451498B1 · kind B1 · utility

Assignee

• Atotech Deutschland GmbH & Co. KG · DE

Inventors

• Rosangela Pirri · Montardon, FR
• Francis Verzaro · Serres-Castet, FR
• Heinrich Meyer · Berlin, DE
• Gonzalo Urrutia Desmasion · Berlin, DE
• Gilles Meunier · Tarbes, FR

Key dates

• Filing date: Apr 6, 2000
• Grant date: Sep 17, 2002
• Expiry date: Apr 6, 2020

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/111
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to photosensitive compositions, which can be developed positively. Traditional compositions have either inadequate photosensitivity or they are not appropriate for use on the copper surfaces, for example of circuit boards, since the exposed coating sections of the composition cannot be completely removed during developing, which results in problems in subsequent plating or etching. In the photosensitive compositions according to the invention, these disadvantages cannot be observed. Various compositions are described, which contain photo acid generators and a polymer resin with side groups, which can split acid, said polymer resin being formed by polymerizing at least three different acrylate- or methacrylate-monomers.