Imageable element and method of preparation thereof
US6451505B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2000 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Aug 4, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/145
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An imageable element comprises: (A) a substrate; and (B) an imageable composition applied to the substrate comprising: (1) a first layer, comprising: (a) a photosensitive composition capable of absorbing actinic radiation; and (b) a photothermal converter; and (2) an ablatable second layer contiguous to the first layer, wherein the second layer is opaque to the actinic radiation.This imageable element advantageously is useful in both positive and negative working printing plate applications, increases the efficiency of use of mask-generating radiation such as IR radiation and eliminates the need for chemicals and additional time to create a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.