METHOD FOR FORMATION OF UPPER MAGNETIC POLE LAYER OF THIN FILM MAGNETIC HEAD, METHOD OF FORMING MINIATURE BLOCK PATTERN WITH HIGH ASPECT RATIO ON BOTTOM PART OF STEP ON SURFACE WITH STEP, AND THIN FILM MAGNETIC HEAD
US6451514B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 24, 1999 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Nov 24, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49048
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for formation of the upper magnetic pole layer of a thin film magnetic head. The presently described method for formation of the upper magnetic pole layer of a thin film magnetic head enables the formation with submicron precision of a resist layer for use in forming the upper magnetic pole layer, which must necessarily be formed on a surface having a step, which can contribute to further improvement of areal recording densities. A frame for use in forming the upper magnetic pole layer is formed from multiple resist layers, and the relatively thick lower resist layer is formed by a vacuum thin film formation method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.