SiO2-coated mirror substrate for EUV
US6453005B2 · kind B2 · utility
6Cited by
1References
14Claims
0Family size
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Key dates
| Filing date | Jan 5, 2001 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Jan 5, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Mirror substrate consisting of crystal, especially silicon crystal, on which an amorphous layer, especially a quartz glass layer, is applied.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.