Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers
US6455234B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 18, 2001 |
| Grant date | Sep 24, 2002 |
| Priority date | — |
| Expiry date | Dec 18, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G2650/60
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
This invention provides water-based compositions, particularly coating, ink, fountain solution and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of an acetylenic diol ethylene oxide/propylene oxide adduct of the structure where r and t are 1 or 2, (n+m) is 1 to 30 and (p+q) is 1 to 30. Use of such adducts as surfactants in photoresist developer/electronics cleaning compositions is particularly advantageous.Also disclosed is a method for making random and block EO/PO adducts of acetylenic diols by reacting an acetylenic diol with EO and/or PO in the presence of a trialkylamine or Lewis acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.