Patent · US Expired

Manufacturing method for fluorine-containing ethane

US6455745B1 · kind B1 · utility

8Cited by
3References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 10, 2001
Grant dateSep 24, 2002
Priority date
Expiry dateJan 10, 2021

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C17/21
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

Fluorochromium oxide having a fluorine content of not less than 30 wt. % is used for the fluorination reaction.To provide a manufacturing method for fluorine-containing ethane which contains 1,1,1,2,2-pentafluoroethane as the main component in which the reaction can be performed while controlling the generation of CFCs to the greatest possible extent by fluorinating at least on selected from the group composed of tetrachloroethylene, 2,2-dichloro-1,1,1-trifluoroethane and 2-chloro-1,1,1,2-tetrafluoroethane with hydrogen fluoride.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.