Method and apparatus for measuring and adjusting a liquid spray pattern
US6457655B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 1, 2000 |
| Grant date | Oct 1, 2002 |
| Priority date | — |
| Expiry date | Sep 1, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0091
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A control system for use in a liquid dispensing system to measure and adjust a liquid spray pattern dispensed from the liquid dispensing system. The control system includes a sensor that detect edges of the liquid spray pattern and, from the detected positions of those edges, is operable to adjust the liquid spray pattern to a pattern width set by the operator. The control system is also operable to measure the width of the liquid spray pattern and the offset of the liquid spray pattern relative to a nozzle centerline of the liquid dispensing system and provide warnings to the operator if those measurements fall outside of acceptable ranges.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.