Compositions and methods for imparting stain resistance
US6458443B2 · kind B2 · utility
4Cited by
18References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 24, 1998 |
| Grant date | Oct 1, 2002 |
| Priority date | — |
| Expiry date | Jul 24, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31786
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The invention concerns a stain resist composition comprising: (a) a component selected from the group consisting of (1) an anionically modified phenol formaldehyde polymer comprising a phenol moiety and a formaldehyde moiety, (2) a naphthalene condensate, (3) a lignin sulfonate, (4) a phenol sulfonate derivative, a mixture thereof and (5) a (meth)acrylic polymer comprising residues of acrylic or methacrylic acid; and (b) a polyester.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.