Diffuse reflectance method and apparatus for determining thickness of an infrared translucent layer
US6459488B1 · kind B1 · utility
9Cited by
5References
6Claims
0Family size
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Key dates
| Filing date | Feb 10, 2000 |
| Grant date | Oct 1, 2002 |
| Priority date | — |
| Expiry date | Feb 10, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0675
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for producing an interferogram of an infrared translucent layer that is on a reflective substrate, comprising generating parallel infrared interferometer beams by means of an infrared interferometer, converging the parallel infrared interferometer beams into converging infrared interferometer beams, sending the converging infrared interferometer beams onto the infrared translucent layer to produce diffusely reflected infrared interferometer rays from above and below the infrared translucent layer, and making the diffusely reflected infrared interferometer rays into parallel reflected infrared interferometer rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.