Aqueous cleaning composition with controlled PH
US6465404B2 · kind B2 · utility
6Cited by
7References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2001 |
| Grant date | Oct 15, 2002 |
| Priority date | — |
| Expiry date | Mar 20, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/16
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Aqueous cleaning compositions in which the pH is controlled comprise an acidic metal cleaning compound; at least one nitrogen containing compound to provide a stabilized pH; an emulsifier, a nonionic surfactant and optionally at least one water soluble solvent having a vapor pressure of less than 4 mm Hg at 20° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.