Micromachined structure with a deformable membrane and method for making same
US6465855B1 · kind B1 · utility
3Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 2001 |
| Grant date | Oct 15, 2002 |
| Priority date | — |
| Expiry date | May 18, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2203/0315
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A micromachined structure able to operate at a high temperature, including a deformable membrane secured on a support allowing for its deformation. The membrane includes at least a membrane layer in a material retaining its elasticity for the high operating temperature. The membrane layer supporting components detect the deformation of the membrane, made in a semiconducting material, and it has an electrically insulating interface with the detection components, formed by an electrically insulating layer. The support is made in a material enabling the membrane to be released by a microelectronics technique.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.