Methods for producing functional films
US6468403B1 · kind B1 · utility
28Cited by
11References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 28, 1994 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | Jul 28, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13439
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for producing a transparent conductive film composed mainly of an oxide by sputtering using a sputtering target capable of forming a transparent conductive film, wherein intermittent electric power is supplied to the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.