Patent · US Expired

Fabrication of optical devices based on two dimensional photonic crystal structures and apparatus made thereby

US6468823B1 · kind B1 · utility

48Cited by
4References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 29, 2000
Grant dateOct 22, 2002
Priority date
Expiry dateOct 11, 2020

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B2006/12078
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A broad class of devices, both active and passive, such as waveguides, microcavities, filters, resonators, lasers, switches, modulators, etc. can be fabricated using the disclosed method. The method is one in which nanocavities in semiconductor membranes can be fabricated, which method is an advantage regardless of the type of device which is ultimately being fabricated therefrom. The method of the invention is illustrated in the case of a photonic crystals waveguide as being made in a silicon-on-insulator (SOI) material. However, the method is not limited to this type of material and can be used in other equivalent material structures such as AlGaAs, InGaAsP, or the like. The semiconductor membranes which are fabricated incorporate two dimensional photonic crystals for confinement of light in the lateral or in-plane direction and total internal reflection for the confinement in vertical direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.