Process for the preparation of crystalline and solvent free iohexol
US6469208B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 4, 1997 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | May 29, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C231/24
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The object of the present invention is an industrial process for the purification and removal of residual solvents from iohexol, based on the suspension of crystalline iohexol, eventually containing residual solvents above 100 ppm, in a fluid wherein it has a low solubility, followed by heating, filtration and drying. The process allows the formation of crystalline iohexol with no residual organic residual solvent above 100 ppm and with an increased purity level.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.