Patent · US Expired

Process for the preparation of crystalline and solvent free iohexol

US6469208B1 · kind B1 · utility

4Cited by
6References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 4, 1997
Grant dateOct 22, 2002
Priority date
Expiry dateMay 29, 2019

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C231/24
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The object of the present invention is an industrial process for the purification and removal of residual solvents from iohexol, based on the suspension of crystalline iohexol, eventually containing residual solvents above 100 ppm, in a fluid wherein it has a low solubility, followed by heating, filtration and drying. The process allows the formation of crystalline iohexol with no residual organic residual solvent above 100 ppm and with an increased purity level.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.