Integrated circuit fuse, with focusing of current
US6469363B1 · kind B1 · utility
7Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 4, 1999 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | May 4, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An integrated circuit fuse is formed on a substrate by etching a polysilicon, metal or alloy layer deposited thereon to include a central region, at the end of which are zones with electrical contacts. The central region has at least two first electrically parallel arms. A zone of intersection of the first two arms forms a point for focusing a fusing current which facilitates the fusing of the fuse by increasing local current density flowing through the integrated circuit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.