Methods for converting features to a uniform micron technology in an integrated circuit design and apparatus for doing the same
US6470477B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 23, 1999 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | Dec 23, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for converting physical features of an integrated circuit design to a uniform micron technology is provided. The integrated circuit design is defined by a plurality of cells with each cell being defined by one or more micron technologies. A user is prompted to provide key design rules that define desired features associated with one or more micron technologies. The method includes examining a layout database for the integrated circuit design with the layout database having a hierarchical structure. A top cell is identified from the layout database of the integrated circuit design. The method then descends through a first branch of the hierarchical structure of the layout database to a lowest cell in the first branch. Afterwards, a determination is made whether or not physical data of the user desired features have been previously processed for the lowest cell. Once that determination is made, the method decides if the physical data of the user desired features for the lowest cell complies with the uniform micron technology. If the features do not comply with the uniform technology, the physical data of the user desired features of the lowest cell is processed. A design rul…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.