Measuring device and process for its manufacture

US6471838B1 · kind B1 · utility

Assignee

• Micronas GmbH · DE

Inventors

• Gunter Igel · Teningen, DE
• Hans-Jurgen Gahle · Emmendingen, DE
• Mirko Lehmann · Glückstadt, DE

Key dates

• Filing date: Feb 18, 2000
• Grant date: Oct 29, 2002
• Expiry date: Feb 18, 2020

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N27/07
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A measuring device (1), for examining a medium (2) that is liquid or free-flowing, has at least two electrically and/or optically conducting layers or layer areas (5a, 5b, 5c, 6a, 6b, 7a, 7b) located on a substrate layer (3), wherein these layers or layer areas are electrically and/or optically insulated from each other. At least one of these layers or layer areas (5a, 5b, 5c, 6a, 6b, 7a, 7b) is part of a layer stack (4), which has several layers arranged on top of each other on the substrate layer (3). The layer stack has, on its side facing away from the substrate layer (3), a recess that adjoins the electrically and/or optically conducting layers or layer areas (5a, 5b, 6a, 6b, 7a, 7b). At least one electrically and/or optically conducting layer or layer area (5a, 5b, 6a, 6b, 7a, 7b) located in the layer stack (4) is spaced at a distance from the bottom (11) of the recess (10).