Method of manufacturing a vibrating structure gyroscope
US6471883B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 22, 1999 |
| Grant date | Oct 29, 2002 |
| Priority date | — |
| Expiry date | Dec 22, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01C19/5684
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photor…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.