Patent · US Expired

Alignment free interferometer and alignment free method of profiling object surfaces

US6473185B2 · kind B2 · utility

15Cited by
9References
42Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 7, 2001
Grant dateOct 29, 2002
Priority date
Expiry dateApr 18, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B2290/15
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An improved method and apparatus for profiling surfaces is provided. The subject apparatus avoids the earlier used constructions of such apparatus in the normally used Fizeau interferometer form, and instead uses a retroreflector (200) located at the end of the optical path (128) of the beam reflecting off of the surface under test (150) in order to achieve alignment-free surface profiling. In addition, in a second embodiment, a second retroreflector (140′) is used to assure a more accurate result. While in yet another improvement, the retroreflector (200) is selectively moveable in relation to the optical path of the beam, to compensate and correct for a shearing effect resulting from the use of variously sized (thicknesses) flats under test.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.