Point array maskless lithography
US6473237B2 · kind B2 · utility
71Cited by
53References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 8, 2001 |
| Grant date | Oct 29, 2002 |
| Priority date | — |
| Expiry date | Apr 19, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for performing digital lithography onto a subject is provided. The system includes a noncoherent light source for producing a first light and an optical diffraction element for individually focusing the first light into a plurality of second lights. The system also includes a pixel panel for generating a digital pattern, the pixel panel having a plurality of pixels corresponding to the plurality of second lights. A lens system may then direct the digital pattern to the subject, thereby enabling the lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.