Method for manufacturing optical filter
US6475557B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 26, 1999 |
| Grant date | Nov 5, 2002 |
| Priority date | — |
| Expiry date | Aug 26, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/22
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for manufacturing an optical filter capable of manufacturing an optical filter in such a manner that the transmission wavelength varies linearly with respect to the angle &thgr; in the rotation direction of the substrate and that almost the entire range of the angle &thgr; is utilizable as the optical filter. A mask capable of being rotated relatively with respect to the substrate coaxially on a plane parallel to the substrate, which is either having an aperture extending along a radius direction with an aperture angle &phgr; or itself extending along a radius direction to cover an angle &phgr;, is provided over the substrate. Then, the mask is relatively rotated with respect to the substrate at least once at a non-constant angular speed during a formation of a single layer or multiple layers on the substrate, while depositing a dielectric material in a single layer or multiple layers on the substrate from the mask side within a deposition chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.