Radiation-sensitive compositions for printing plates for improving their chemical and developer resistance and printing plates comprising such compositions
US6475692B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2000 |
| Grant date | Nov 5, 2002 |
| Priority date | — |
| Expiry date | Aug 2, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0233
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Radiation-sensitive compositions comprise at least one novolak, at least one naphthoquinone diazide derivative and a copolymer; the copolymer consisting of the units A, B and C wherein unit A is present in an amount of 5 to a maximum of 50 mol % and R1 and R4 are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20 to 70 mol % and R2, R6 and R7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10 to 50 mol % and R3 and R5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C. Furthermore, the invention describes printing plates produced therefrom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.