Patent · US Expired

Wafer scale processing

US6476415B1 · kind B1 · utility

17Cited by
4References
41Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 20, 2000
Grant dateNov 5, 2002
Priority date
Expiry dateJul 20, 2020

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/136277
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

This invention relates to a method of fabricating a light modulation system having a semiconductor substrate. In one exemplary method, an optical layer is applied over a semiconductor substrate which includes a plurality of integrated circuits. Each of these integrated circuits is capable of creating a separate display device. A protective layer is then applied over the optical layer. The plurality of integrated circuits is then singulated. Various other embodiments of apparatuses and methods are disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.