Wafer scale processing
US6476415B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2000 |
| Grant date | Nov 5, 2002 |
| Priority date | — |
| Expiry date | Jul 20, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136277
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention relates to a method of fabricating a light modulation system having a semiconductor substrate. In one exemplary method, an optical layer is applied over a semiconductor substrate which includes a plurality of integrated circuits. Each of these integrated circuits is capable of creating a separate display device. A protective layer is then applied over the optical layer. The plurality of integrated circuits is then singulated. Various other embodiments of apparatuses and methods are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.