Light scattering apparatus and method for determining radiation exposure to plastic detectors
US6476910B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 29, 2000 |
| Grant date | Nov 5, 2002 |
| Priority date | — |
| Expiry date | Feb 12, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N15/075
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved system and method of analyzing cumulative radiation exposure registered as pits on track etch foils of radiation dosimeters. The light scattering apparatus and method of the present invention increases the speed of analysis while it also provides the ability to analyze exposure levels beyond that which may be properly measured with conventional techniques. Dosimeters often contain small plastic sheets that register accumulated damage when exposed to a radiation source. When the plastic sheet from the dosimeter is chemically etched, a track etch foil is produced wherein pits or holes are created in the plastic. The number of these pits, or holes, per unit of area (pit density) correspond to the amount of cumulative radiation exposure which is being optically measured by the apparatus. To measure the cumulative radiation exposure of a track etch foil a high intensity collimated beam is passed through foil such that the pits and holes within the track etch foil cause a portion of the impinging light beam to become scattered upon exit. The scattered light is focused with a lens, while the primary collimated light beam (unscattered light) is blocked. The scattered light is f…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.