Systems and methods for locating a pattern in an image
US6477275B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 16, 1999 |
| Grant date | Nov 5, 2002 |
| Priority date | — |
| Expiry date | Jun 16, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30152
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
In one aspect the invention provides processes for locating a pattern within an image that can comprise the acts of providing a template representative of the pattern to be located within an image. The image can be subdivided into a plurality of sub-images, each being representative of a portion of the image. The process can then compare each of the sub-images to the template to generate a plurality of score signals representative of a location of the pattern, and can then process the score signals to determine a location for the pattern. In one practice, the step of processing the score signals can include a step of identifying at least one sub-image that includes a degraded image. As described above, a degraded image can include an image that has had a portion obscured by shadows or debris. Additionally, an image can be degraded at spots of high-reflection that create glare and wash-out portions of the image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.