Pyrochlore thin films and process for making
US6482527B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2000 |
| Grant date | Nov 19, 2002 |
| Priority date | — |
| Expiry date | Oct 27, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2495
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A thin film comprising a pyrochlore represented by the formula:(Bi3xZn2−3x)(ZnxNb2−x)O7wherein x is from about 0.45 to about 0.73 and an article comprising a substrate and, coated on the substrate, a thin film of the pyrochlore are provided. Also provided is a process for depositing on a substrate the above pyrochlore thin film. The process includes the steps of coating the substrate with a composition comprising bismuth carboxylate, zinc carboxylate, niobium alkoxide, an organic solvent, an organic acid and an organic base, heating to remove organic components and annealing at a temperature and for a length of time sufficient to produce the pyrochlore thin film on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.