Hologram and process for producing hologram
US6483611B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 4, 2000 |
| Grant date | Nov 19, 2002 |
| Priority date | — |
| Expiry date | May 4, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2270/23
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is provided a hologram with excellent heat resistance. The hologram comprises a hologram film (10) in which a diffraction grating has been recorder, a substrated (11) situated on one side of the hologram film (10) via a bonding material (13), and a polymer film (12) situated on the other side of the hologram film (10) via a bonding material (13), wherein the thickness of the polymer film (12) is no greater than 100 &mgr;m. Otherwise, the polymer film (12) is subjected to prior heat treatment.There is further provided a production process for holograms with minimal appearance defects. The process comprises preparing a photopolymer (210) coated onto a substrate (211) and affixing the photopolymer surface (301) onto a photographed object original (213), exposing it to laser light to converting it into a hologram (201), then releasing the hologram (201) from the photographed object original (213) to expose the hologram surface (302) and finally affixing a protective film (215) onto the hologram surface (302), such that the bonding strength A between the substrate (211) and the hologram (201) is greater than the bonding strenght B between the hologram (201) and the protective film…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.