Method of fabricating an optical component
US6483964B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 22, 1998 |
| Grant date | Nov 19, 2002 |
| Priority date | — |
| Expiry date | Jul 22, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12176
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical component comprising one or more optical elements (35′) aligned with the end(s) of one or more waveguides (25′) is fabricated by a process in which, first of all, a doped silica core layer (20) is deposited on a substrate (10) (or on a buffer layer on the substrate), and subsequently a partial overclad layer (30A) typically 1-5 &mgr;m thick is deposited on the core layer. The partial overclad layer and core layer are patterned and etched so as simultaneously to define the optical element(s) and the waveguide core(s). Afterwards, the overclad is completed by depositing a further overclad layer (30B). In the case of application of this fabrication method to a grating-based NBWDM device, the metallisation of the grating can precede or follow the deposition of the second overclad portion (30B). In either case, low-temperature deposition processes are required for deposition of this second overclad portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.