Method at detection of presence of hydrogen gas and measurement of content of hydrogen gas
US6484563B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2001 |
| Grant date | Nov 26, 2002 |
| Priority date | — |
| Expiry date | Jun 27, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/0026
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to a method at detection of presence of hydrogen gas and measurement of content of hydrogen gas. The detection is performed by means of a hydrogen gas sensitive semiconductor sensor, whose output signal is used for determination of the content of hydrogen gas in the gas sample. The semiconductor sensor is exposed to the gas sample during a detection interval, which is preceded by a time-interval of preconditioning treatment during which the semiconductor sensor is exposed to a surrounding gas atmosphere. The invention is characterized in that the gas atmosphere contains a negligible amount of oxygen, hydrogen and carbon monoxide compared to the gas sample and that the time interval is many times longer than the detection interval.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.