Process chamber
US6485531B1 · kind B1 · utility
59Cited by
4References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 27, 1999 |
| Grant date | Nov 26, 2002 |
| Priority date | — |
| Expiry date | Aug 27, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In a process chamber (1), in which various processing steps in the manufacture of semiconductors can be carried out, there is arranged a rotationally drivable rotary head (3) which serves as a holder for a substantially disc-shaped object to be processed (W), e.g. for a wafer. Furthermore, at least one applicator (50, 51, 52, 53) is provided in the process chamber (1) for the provision of a medium which acts on the object to be processed (W). Means (4) are arranged radially around the rotary head (3) for the journalling and for the driving of the rotary head (3).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.