Remote resistivity measurement
US6486685B1 · kind B1 · utility
2Cited by
34References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 8, 2000 |
| Grant date | Nov 26, 2002 |
| Priority date | — |
| Expiry date | Sep 8, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/308
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus and method for measuring surface resistivity of a wafer (12). A source of high frequency radiation (6, 41) emits an incident wave burst that impinges the wafer at a desired spot location. A reflected wave burst is detected at an appropriate time window by a receiver (8, 42). The relationship between incident and reflected energies is a function of the surface resistivity of the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.