Methods and apparatus for measurement and correction of optical aberration
US6486943B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2000 |
| Grant date | Nov 26, 2002 |
| Priority date | — |
| Expiry date | Jun 20, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0025
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The invention relates to methods and apparatus for determining a characteristic of an optical element. The apparatus includes a spatial light pattern generator adapted to generate a beam of light at a predetermined spatial position, at least one lenslet disposed in an array of lenslets adapted to receive the beam of light from the spatial light pattern generator, and to direct the beam of light to the optical element. The apparatus further includes a detector positioned to receive the beam of light subsequent to the beam of light encountering the optical element. The detector is adapted to detect a received spatial position at which the detector receives the beam of light. The apparatus also includes a processor adapted to compare the predetermined spatial position with the received spatial position to determine the characteristic of the optical element. The invention further relates to methods and apparatus for generating a diffraction limited image. The apparatus includes a spatial light pattern generator adapted to generate a plurality of beams of light at selected spatial positions to compensate for a characteristic of an optical element and an array of lenslets adapted to rece…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.