Vertical cavity apparatus with tunnel junction
US6487230B1 · kind B1 · utility
37Cited by
107References
101Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 23, 2000 |
| Grant date | Nov 26, 2002 |
| Priority date | — |
| Expiry date | Dec 9, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/8142
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A vertical cavity apparatus includes a first mirror, a substrate and a second mirror coupled to the substrate. At least a first and a second active region are each positioned between the first and second mirrors. At least a first ion implantation layer is positioned between the first and second mirrors. At least a first tunnel junction is positioned between the first and second mirrors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.