Fine detail photoresist barrier
US6489084B1 · kind B1 · utility
10Cited by
11References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 18, 2000 |
| Grant date | Dec 3, 2002 |
| Priority date | — |
| Expiry date | Jan 24, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2202/03
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The photoresist barrier layer of an inkjet printer printhead is processed to enable channels narrower than a predetermined width in the barrier layer to be created without blockage. Relatively large volumes of photoresist which form a wall of the channel are exposed to a partial exposure of electromagnetic radiation to yield a reduced concentration of photoresist barrier layer in the large volume.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.