Rotating device for plasma immersion supported treatment of substrates
US6490993B2 · kind B2 · utility
0Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 9, 1999 |
| Grant date | Dec 10, 2002 |
| Priority date | — |
| Expiry date | Sep 9, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4584
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A rotary drive which is suitable in treatment of three-dimensional workpieces. In this rotary apparatus, only the removably mounted rotatable rods that serve as sample holders are connected to high voltage, which is delivered via a central high-voltage lead-in at the lower end of the rods, while the actual drive elements for rotating the rods are electrically insulated therefrom by suitable ceramic insulating elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.