Patent · US Expired

Rotating device for plasma immersion supported treatment of substrates

US6490993B2 · kind B2 · utility

0Cited by
7References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 9, 1999
Grant dateDec 10, 2002
Priority date
Expiry dateSep 9, 2019

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/4584
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A rotary drive which is suitable in treatment of three-dimensional workpieces. In this rotary apparatus, only the removably mounted rotatable rods that serve as sample holders are connected to high voltage, which is delivered via a central high-voltage lead-in at the lower end of the rods, while the actual drive elements for rotating the rods are electrically insulated therefrom by suitable ceramic insulating elements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.