Electrolytic etching method, method for producing photovoltaic element, and method for treating defect of photovoltaic element
US6491808B2 · kind B2 · utility
5Cited by
11References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 9, 1998 |
| Grant date | Dec 10, 2002 |
| Priority date | — |
| Expiry date | Sep 9, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25F3/02
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, where the contact angle of the electrolyte to the object to be etched is not more than 70°. This electrolytic etching method can etch the object in a non-contact manner, can reduce the cost, number of steps, and processing time, and can enhance the patterning accuracy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.