Manufacturing method of spacer for electron-beam apparatus and manufacturing method of electron-beam apparatus
US6494757B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 24, 2000 |
| Grant date | Dec 17, 2002 |
| Priority date | — |
| Expiry date | Feb 24, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a manufacturing method of a spacer for an electron-beam apparatus which includes an airtight container and an electron source, the spacer is arranged in the airtight container. The method includes the step of heating and drawing a base material of the spacer to form a desired rough state on the surface of the base material, the step of heating and drawing the base material of the spacer to form the desired rough state and an electroconductive film on the surface of the base material, or the step of heating and drawing the base material of the spacer having the rough state on its surface. According to the present invention, the spacer having a surface structure which can suppress charging can be manufactured at a low cost, and an electron-beam apparatus such as an image-forming apparatus having a sufficient display luminance can also be manufactured.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.