Silicon oxynitride protective coatings
US6495251B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 9, 1998 |
| Grant date | Dec 17, 2002 |
| Priority date | — |
| Expiry date | Apr 9, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A layer for protecting an underlying functional coating stack for example a single silver layer or double silver layer Low-E coating stack includes silicon oxynitride or silicon aluminum oxynitride layer. The protective film may have a uniform composition throughout its thickness i.e. homogeneous protective layer, a constantly increasing or decreasing index of infraction throughout its thickness i.e. a graded protective layer, or a combination of all or some of the foregoing i.e. a non-homogeneous protective layer. The graded and non-homogeneous layers may have an outer surface of silicon nitride, silicon aluminum nitride, silicon dioxide, silicon oxynitride or silicon aluminum oxynitride. The protective layer of the invention may be the last layer deposited on the functional coating stack or may have a film deposited thereon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.